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|
Borides
A-B-C-D-E-F-G-H-I-J-K-L-M-N-O-P-Q-R-S-T-U-V-W-X-Y-Z
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Material
Composition
|
Typical Purity
|
Melting Point
C
|
Density
|
Targets
|
Evap.
Material
|
E-Beam Starter Source
|
Notes
|
Chromium-
Boride
CrB2
|
99.5%
|
842
|
4.356
|
X
|
X
|
X
|
See notes below.
|
Hafnium Boride
HfB2
|
99.5%
|
3250
|
|
X
|
X
|
X
|
See notes below.
|
Lanthanum
Boride
LaB6
|
99.5%
|
2210
|
2.61
|
X
|
X
|
X
|
See notes below.
|
Molybdenum Boride
Mo2B, MoB
|
99.5%
|
|
9.26
8.65
|
X
|
X
|
X
|
See notes below.
|
Niobium
Boride
NbB2, NbB
|
99.5%
|
2900
|
6.97
|
X
|
X
|
X
|
See notes below.
|
Tantalum
Boride
TaB2
|
99.5%
|
3000
|
|
X
|
X
|
X
|
See notes below.
|
Tantalum
Boride
TaB2
|
99.5%
|
2900
|
|
X
|
X
|
X
|
See notes below.
|
Tungsten Boride
WB, W2B
|
99.5%
|
|
4.5
|
X
|
X
|
X
|
See notes below.
|
Vanadium
Boride
VB2
|
99.5%
|
2400
|
5.10
|
X
|
X
|
X
|
See notes below.
|
Zirconium Boride
ZrB2
|
99.5%
|
3040
|
6.085
|
X
|
X
|
X
|
See notes below.
|
| Borides in general are used
for wear-resistant films and to produce semiconducting films. Titanium
boride and zirconium boride films increase the life of cutting tools.
Lanthanum boride films are thermionic conductors. Boride films provide
neutron-absorbing layers on nuclear fuel pellets. Borides are being
investigated for use as diffusion barriers in both silicon and III-V device
technology in multilevel metallization schemes involving aluminum as a
second level. |
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